发明名称 |
SYSTEM AND METHOD FOR USING A TWO PART COVER FOR PROTECTING A RETICLE |
摘要 |
<p>A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.</p> |
申请公布号 |
SG155813(A1) |
申请公布日期 |
2009.10.29 |
申请号 |
SG20080025256 |
申请日期 |
2003.03.06 |
申请人 |
ASML HOLDING N.V. (NL) |
发明人 |
PUERTO SANTIAGO DEL;MASSAR ANDREW;ALIKHAN ABDULLAH;FEROCE JONATHAN H.;LOOPSTRA ERIC R.;KISH DUANE P.;OLSEN WOODROW J. |
分类号 |
(IPC1-7):G03F7/20;G03F1/14;G03F9/00;H01L21/027 |
主分类号 |
(IPC1-7):G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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