| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which can prevent fixing of a cover plate with a shower plate from occurring due to a reaction product produced in a gap part, when the cover plate is provided on the shower plate, and to provide a vapor deposition method therefor. Ž<P>SOLUTION: The cover plate 26 which covers the shower plate 21 and has a gas through-hole H2 that has the same center as a gas spouting hole H1 of the shower plate 21 is provided on the surface side of the shower plate 21, which opposes to a substrate 3 to be film-formed so as to form a gap between itself and the shower plate 21. A recess SO and a salient CT which form a concavoconvex shape for inhibiting a gas from flowing into the gap are provided on the surface of the shower plate 21 opposing to the substrate 3 to be film-formed and the surface of the cover plate 26 opposing to the shower plate 21. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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