发明名称
摘要 PROBLEM TO BE SOLVED: To enable good patterning, to enhance contrast by a cost-wise advantageous photolithography method and to form a black partition wall having a low reflectance by using a photosensitive paste which contains a low melting point glass and blackens after baking. SOLUTION: The photosensitive paste contains a low melting point glass and blackens after baking. Since the low melting point glass is used, patterning in exposure is not blocked and a partition wall is formed by baking. When lithium oxide is further incorporated into the low melting point glass powder, the control of the refractoriness of the glass under load and the coefficient of thermal expansion of the glass is facilitated, and since the average refractive index of the glass is lowered, the refractive index difference between the glass and an organic material is easily reduced. The blackening property is attained by incorporating a compound which is converted to a black oxide by baking into the paste.
申请公布号 JP4352509(B2) 申请公布日期 2009.10.28
申请号 JP19990159229 申请日期 1999.06.07
申请人 发明人
分类号 G03F7/004;G03F7/027;G03F7/028;G03F7/038;G09F9/313;H01J9/24;H01J11/22;H01J11/34;H01J11/36 主分类号 G03F7/004
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