REFLECTIVE MASK BLANC FOR EUV LITHOGRAPHY,申请号EP20070860104-传众专利搜索

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发明名称	REFLECTIVE MASK BLANC FOR EUV LITHOGRAPHY
摘要
申请公布号	EP1973147(A4)	申请公布日期	2009.10.28
申请号	EP20070860104	申请日期	2007.12.25
申请人	ASAHI GLASS COMPANY, LIMITED	发明人	HAYASHI, KAZUYUKI;KADOWAKI, KAZUO;SUGIYAMA, TAKASHI
分类号	H01L21/027;G03F1/24;G03F1/54;G03F7/20	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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