发明名称 FILM-FORMING METHOD AND FILM-FORMING APPARATUS
摘要 <p>Provided is a reflective film-forming technique which can simplify and reduce the cost of the film-forming apparatus configuration. The film-forming method of the present invention comprises a reflective film-formation step (P2) for forming a light-reflecting film by performing vapor deposition on an object while introducing air into a film-formation region, a polymer film formation step (P3) for forming a water-repellent polymer film on this reflective film, and a hydrophilization treatment step (P5) for performing hydrophilization treatment by plasma on the above-mentioned water-repellent polymer film while introducing air into the film-formation region. This invention enables formation of the reflective film and hydrophilization treatment of the polymer film without use of argon gas.</p>
申请公布号 WO2009131036(A1) 申请公布日期 2009.10.29
申请号 WO2009JP57494 申请日期 2009.04.14
申请人 ULVAC, INC.;KOBAYASHI, YOUSUKE;HAYASHI, NOBUHIRO;IIJIMA, MASAYUKI;TADA, ISAO 发明人 KOBAYASHI, YOUSUKE;HAYASHI, NOBUHIRO;IIJIMA, MASAYUKI;TADA, ISAO
分类号 C23C14/06;C23C14/12;C23C14/58;G02B5/08 主分类号 C23C14/06
代理机构 代理人
主权项
地址