| 摘要 |
A photomask material comprising a transmissive substrate and a photosensitive layer formed on a temporary substrate laminated on the transmissive substrate with the photosensitive layer faced to the transmissive substrate and a process of manufacturing a photomask from the photomask material is disclosed. The photosensitive layer is made of a composition comprising at least an alkali-soluble resin binder having a polymerizable unsaturated bond, a monomer having at least one polymerizable unsaturated bond, an photopolymerization initiator sensitive to light of a wavelength longer than 405 nm and a colorant surface-treated with a polymerizable dispersant. |
