发明名称 Mask overlay for infrared target assembly
摘要 An infrared target for use with indoor industrial G.P.S. has at least one mask or overlay applied to the lens of the target. The mask increases the precision of setting the location of any instrument, assembly, machinery, or component to be machined, during industrial applications. The mask improves position tolerances to 0.0005 inch or less. Further, a reflective ring positioned upon the overlay serves as a marker for laser light at lesser tolerance than the overlay.
申请公布号 US7609439(B2) 申请公布日期 2009.10.27
申请号 US20060325972 申请日期 2006.01.04
申请人 HUBBS MACHINE & MANUFACTURING CO. 发明人 HUBBS WILLIAM O.
分类号 G02B13/14 主分类号 G02B13/14
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