SINGLE CLEANING APPUTUS HAVING GAS EXHAUSTLINE

摘要

PURPOSE: A single cleaning apparatus having gas exhaust line is provided to prevent a foreign material including particles from being adsorbed in the substrate surface. CONSTITUTION: The single cleaning apparatus having gas exhaust line includes the chamber(200), the spin chuck(220), the second nozzle, the train port(240), and the single cleaning equipment. The spin chuck is mounted to the substrate to form the first and second heights. The second nozzle supplies dry gas to the chamber. The first nozzle supply deionized water and chemical solutions. The drain ports discharge chemical solutions or the deionized solution and is installed to the spin chuck. The single cleaning equipment includes the gas exhaust line which discharges the gas and residue and is installed to the spin chuck.