发明名称 APPARATUS FOR IMPRINTING FINE STRUCTURES
摘要 <p>PURPOSE: A micro pattern imprint apparatus is provided to obtain micro pattern of high quality by adding proton. CONSTITUTION: A micro pattern imprint apparatus comprises a chamber base (100), substrate support device (101), first chamber lid (110), first stamp support device (111), second chamber lid (120), and second stamp support device (121,122). The substrate support device is installed on the chamber base and supports a substrate (S) on which photoresist resin is applied. The first chamber lid operates to form the first closed space. The first stamp support device is installed at the first chamber lid. The second chamber lid operates the second closed space. The second stamp support device is installed at the second chamber lid.</p>
申请公布号 KR20090111562(A) 申请公布日期 2009.10.27
申请号 KR20080037240 申请日期 2008.04.22
申请人 ADP ENGINEERING CO., LTD. 发明人 KIM, EUN SUK;AHN, HYUN HWAN;LIM, YONG JIN;KWON, GYU HO;CHOI, JUNG SU
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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