发明名称 |
APPARATUS FOR IMPRINTING FINE STRUCTURES |
摘要 |
<p>PURPOSE: A micro pattern imprint apparatus is provided to obtain micro pattern of high quality by adding proton. CONSTITUTION: A micro pattern imprint apparatus comprises a chamber base (100), substrate support device (101), first chamber lid (110), first stamp support device (111), second chamber lid (120), and second stamp support device (121,122). The substrate support device is installed on the chamber base and supports a substrate (S) on which photoresist resin is applied. The first chamber lid operates to form the first closed space. The first stamp support device is installed at the first chamber lid. The second chamber lid operates the second closed space. The second stamp support device is installed at the second chamber lid.</p> |
申请公布号 |
KR20090111562(A) |
申请公布日期 |
2009.10.27 |
申请号 |
KR20080037240 |
申请日期 |
2008.04.22 |
申请人 |
ADP ENGINEERING CO., LTD. |
发明人 |
KIM, EUN SUK;AHN, HYUN HWAN;LIM, YONG JIN;KWON, GYU HO;CHOI, JUNG SU |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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