| 摘要 |
PURPOSE: A method for producing a phase shift mask is provided to protect transparent substrate part which is exposed between phase shift film pattern using a negative resist film. CONSTITUTION: A method for producing a phase shift mask comprises: a step of preparing the phase shift mask in which first phase shift film pattern (110) is placed on a substrate (100); a step of forming resist film on the transparent substrate in which first phase shift film pattern is placed; a step of performing light exposure with UV on rear side of transparent substrate which faces to the resist film; a step of forming resist film pattern (131) to the light exposed resist film; a step of etching the first phase shift film pattern in a specific thickness; and a step of converting to the second phase shift film pattern (110a). |
