发明名称 |
Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method |
摘要 |
A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass.
|
申请公布号 |
US7608542(B2) |
申请公布日期 |
2009.10.27 |
申请号 |
US20060587902 |
申请日期 |
2006.06.12 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
UEDA SHUHEI;SHIBANO YUKIO;WATABE ATSUSHI;KUSABIRAKI DAISUKE |
分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|