| 摘要 |
PURPOSE: An apparatus for processing substrate and method for opening and closing process space inside of the same are provided to uses a simple opening and closing manner by the movement of a moving rail. CONSTITUTION: An apparatus for processing substrate includes the lower chamber(61), the upper chamber(62), the support rail, switchgears(63,64), the elevating shaft(105), the first elevating shafts, and the second elevating shafts. The upper chamber forms the process space shut tightly from an outside and is arranged on the top of the lower chamber. The support rail is arranged in one side of the lower chamber. The elevating shaft includes the switchgear which opens and closes the upper chamber and is connected to the upper chamber and is installed in the support rail. The elevating shaft is connected to the support rail. The second elevating shafts are connected to the upper chamber.
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