METHOD FOR FORMING DEVICE ISOLATION LAYER IN SEMICONDUCTOR DEVICE,申请号KR20020082775-传众专利搜索

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发明名称	METHOD FOR FORMING DEVICE ISOLATION LAYER IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100923760(B1)	申请公布日期	2009.10.27
申请号	KR20020082775	申请日期	2002.12.23
申请人		发明人
分类号	H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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