发明名称 METHOD FOR MANUFACTURING CAPACITOR WITH PILLAR STORAGE NODE
摘要 PURPOSE: A method for manufacturing a capacitor including a pillar type storage node is provided to prevent a crack of a storage node by inserting a buffer film to an inner part of a conductive film used as a storage node in forming a pillar type storage node. CONSTITUTION: An insulation film(22) having an open region is formed on a substrate(21). A first conductive film(27A) and a buffer film(28A) are successively formed on the insulation film. A second conductive film(29A) is formed on the buffer film, and is filled in the open region. The first conductive film, the buffer film, and the second conductive film remains inside the open region through a storage node separation process. A pillar type storage node is completed by forming a third conductive film(31) which connects the first conductive film to the second conductive film. The insulation film is removed. A dielectric film and a top electrode are successively formed on the storage node.
申请公布号 KR20090111018(A) 申请公布日期 2009.10.26
申请号 KR20080036562 申请日期 2008.04.21
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, YOUNG DAE;LEE, KEE JEUNG;KIL, DEOK SIN;KIM, JIN HYOCK;DO, KWAN WOO;PARK, KYUNG WOONG;LEE, JEONG YEOP
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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