| 摘要 |
A device for vaporation of materials consists of a technological chamber in which a crucible is placed with the vapor collector installed above it, the heaters located externally and consistently functionally connected, the microprocessor control system of the heater and the check system of process state, with the mass strain-gage sensor located above the technological chamber in individual case, with probing device placed inside the technological chamber. The partial generator on demountable resistance is introduced in device, which input is connected to output of mass strain-gage sensor control, and output is connected with the outlet of the check system of process state. |
