| 摘要 |
PURPOSE: A resistive conduction line for a MEMS probe and a manufacturing method thereof are provided to perform a stable property at a high temperature of a low temperature co-fired ceramic multilayer substrate. CONSTITUTION: A low temperature co-fired ceramic substrate(100) is prepared, and is sintered under 1000°C. A thick film resistance layer is formed on the low temperature co-fired ceramic substrate. An insulation film(7) is formed on the thick film resistance layer. A thin film conduction line(8) is formed on the insulation film and the thick film resistance layer. The thick film resistance layer is formed on a via hole pillar conductor prepared on a top part of the low temperature co-fired ceramic substrate. |
