| 摘要 |
PURPOSE: A solid imaging apparatus and a manufacturing method thereof and an electronic device are provided to improve the pixel characteristic without increasing the number of fabrication process. CONSTITUTION: A solid imaging apparatus is comprised of a pixel, a peripheral circuit section, a silicide shielding layer, and a transistor. The silicide shielding layer is formed on a part of the element isolation part or the whole area of the pixel. The transistor becomes the metal silicide formed at the peripheral circuit section.
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