| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of carrying out exposure processing while keeping an approximately constant state of thermal distortion in a member or the like supporting a spatial light modulation element. <P>SOLUTION: In an exposure apparatus, a laser beam from a laser unit is modulated by a spatial light modulation element 11 and guided to a photosensitive material on a substrate. On an optical path of the laser beam from the laser unit to the spatial light modulation element 11, a shutter 14 is provided which is opened/closed for passing and cutting off the laser beam toward the spatial light modulation element 11. The shutter 14 is opened when exposure processing is started, and is closed when exposure processing is ended. Furthermore, the shutter 14 is opened/closed at suitable timing even for other than exposure processing. <P>COPYRIGHT: (C)2010,JPO&INPIT |
