| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method capable of improving the productivity of substrates. <P>SOLUTION: Even if a difference between the minimum height F<SB>k</SB>and maximum height N<SB>k</SB>of a photosensitive layer 16a is smaller than a focus adjusting range R and portions of the maximum height N<SB>k</SB>and the minimum height F<SB>k</SB>of the photosensitive layer 16a on an exposure position are located within the focus adjusting range R in which a focus position of a scanner 21 can be adjusted, the height of a stage 14 wherein an average value or a center value of heights of a plurality of portions of the photosensitive layer 16a approximately coincides with a center value in the focus adjusting range in which the focus position of the scanner 21 can be adjusted is calculated, and a position of at least either of the stage 14 on which a substrate carried into the scanner 21 after the substrate 16 about which the height of the stage 14 is calculated is mounted, and the scanner 21, is changed based on one or more calculated heights of the stage 14 to correct a positional relation between the stage 14 and the scanner 21 before carrying the substrate 16 into a displacement sensor 19. <P>COPYRIGHT: (C)2010,JPO&INPIT |
