| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a colored photosensitive composition capable of suppressing the occurrence of a residue from the next color (for example, from the second color) remaining on an unexposure part and on a colored pattern (for example, the first color pattern) and color mixture accompanied by the residue, and capable of forming a high-resolution pattern. <P>SOLUTION: The colored photosensitive composition contains a colorant and a surfactant, as a solid content, by 0.1 mass% to 7.5 mass% per total mass of the composition, and further contains an oxime-based polymerization initiator. <P>COPYRIGHT: (C)2010,JPO&INPIT |
