发明名称 SEMICONDUCTOR DEVICE WITH RECESS GATE AND METHOD OF FABRICATING THE SAME
摘要 A semiconductor device with a recess gate includes a substrate, a semiconductive layer having an opening corresponding to a gate region, a gate electrode filled in the opening, and a gate insulating layer interposed between the gate electrode and the substrate, and between the gate electrode and the semiconductive layer.
申请公布号 US2009263960(A1) 申请公布日期 2009.10.22
申请号 US20090492775 申请日期 2009.06.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JUNG YOUNG-KYUN
分类号 H01L21/28 主分类号 H01L21/28
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