发明名称 APPARATUS FOR MANUFACTURING A QUANTUM-DOT ELEMENT
摘要 An apparatus for manufacturing a quantum-dot element is disclosed. The apparatus includes a reaction chamber for evaporating or sputtering at least one electrode layer or at least one buffer layer on the substrate. The substrate-supporting base is located inside the reaction chamber for fixing the substrate. The atomizer has a gas inlet and a sample inlet. More specifically, the gas inlet and the sample inlet feed the atomizer respectively with a gas and a precursor solution having a plurality of functionalized quantum dots, and thereby form a quantum-dot layer on the substrate. The apparatus of the present invention can form a quantum dot layer with uniformly distributed quantum dots and integrate the processes for forming a quantum-dot layer, a buffer layer, and an electrode layer together at the same chamber. Therefore, the quality of produced element can be substantially improved.
申请公布号 US2009263580(A1) 申请公布日期 2009.10.22
申请号 US20090494706 申请日期 2009.06.30
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN HSUEH-SHIH;LO DAI-LUON;CHANG GWO-YANG;CHEN CHIEN-MING
分类号 C23C16/44;B82B1/00;B82B3/00;H01L21/20 主分类号 C23C16/44
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