| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a positive resist composition, which can suppress the occurrence of a defect of a resist pattern after development, especially a fine scum or a micro bridge, and hardly causes line edge roughness, and to provide the resist composition, and a pattern formation method using the resist composition. <P>SOLUTION: The method of manufacturing the positive resist composition that comprises: a resin (A) which contains a specified recurring structural unit and is decomposed by the action of acid to increase the dissolution in alkali developing liquid; a compound (B) which produces acid by the irradiation with active light rays or radiative rays; and solvent (C), wherein the method includes a filtration process. In the filtration process, the resin is caused to pass through a filter having a filtration film consisting of nylon. <P>COPYRIGHT: (C)2010,JPO&INPIT |
