| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multi-tone photomask of which the variation of in-plane transmittance can be reduced, and to provide a method of manufacturing the same. <P>SOLUTION: In the method of manufacturing the multi-tone photomask, a light-shielding film and a semi-transmissive film transmitting a portion of exposure light are formed on a transparent substrate and are respectively patterned as prescribed to form a transfer pattern including a light-shielding part, a semi-transmissive part transmitting a portion of exposure light, and a light-transmissive part. In this method, the semi-transmissive film and the light-shielding film are patterned by wet etching to form the transfer pattern, and at least part of the semi-transmissive film of the transfer pattern is subjected to surface modification treatment to change an exposure light transmittance of the semi-transmissive film, whereby a transmittance in-plan distribution range of the semi-transmissive part existing in the transfer pattern is reduced. <P>COPYRIGHT: (C)2010,JPO&INPIT |
