| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a defect inspection device, capable of detecting a minute defect on the surface or the end face of a substrate such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. <P>SOLUTION: The defect inspection device comprises an illumination optical system 101, a plurality of detection optical systems 102, and a signal processing unit 105. Upon inspecting a portion around an edge part of a sample and a portion around an edge grip part of the sample, in detection optical systems 41, 87 into which at least one of diffracted light generated around the edge part of the sample and diffracted light generated from the edge grip part of the sample enters, among the plurality of detection optical systems, a light-shielding unit shields the entering diffracted light, based on a signal obtained by monitoring the strength of the entering diffracted light. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
