| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photo-curable composition capable of forming a pixel pattern having a minute pattern size such as line width of 2.5 μm or less with a low exposure amount, capable of suppressing the occurrence of residue between pixels and capable of suppressing exposure dependency of the pattern size low. <P>SOLUTION: The photo-curable composition comprises: at least a binder polymer (A); a polyfunctional photo-curable compound (B) having acid functional groups and/or 2C or more alkyleneoxy chain; an oxime type photopolymerization initiator (C); a pigment (D-1); and a compound (D-2) which has a pigment core structure and an amino group in a molecule. <P>COPYRIGHT: (C)2010,JPO&INPIT |
