| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having less production of residue upon forming a pattern and exhibiting excellent linearity of thin lines in a formed pattern, to provide a light-shielding color filter formed from the above photosensitive resin composition and a method of producing the same, and to provide a solid-state image sensor. <P>SOLUTION: The resin composition contains at least (A) titanium black, (B) a photopolymerization initiator, (C) a polymerizable compound, (D) a resin and (E) an organic solvent, wherein a weight ratio (W<SB>C</SB>/W<SB>A</SB>) of the total weight W<SB>C</SB>of the polymerizable compound to the total weight W<SB>A</SB>of the titanium black ranges from 0.02 to 0.4. The light-shielding color filter formed from the above photosensitive resin composition and the method of producing the same, and the solid-state image sensor having the light-shielding color filter are also provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
