| 摘要 |
<P>PROBLEM TO BE SOLVED: To shorten the micropattern drawing time in an electron beam drawing method of drawing a desired micropattern on a resist by means of an electron beam. Ž<P>SOLUTION: In the electron beam drawing method of drawing a desired micropattern on a substrate 10 having a resist 11 applied thereon and installed on a rotating stage 41, by the scanning of an electron beam EB, while making the rotating stage 41 rotate, the rotation of the rotating stage 14 is controlled so that the rotation speed is higher for drawing on inner peripheral tracks and lower for drawing on outer peripheral tracks which is inversely proportional to the radius of drawing positions, to fix a linear speed of micropattern drawing in radial positions of the rotating stage 41, and the resist 11 is pre-exposed, prior to the drawing of micropattern. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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