发明名称 MANUFACTURING METHOD FOR PATTERN FORMED BODY BY VACUUM ULTRAVIOLET RAY
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a pattern formed body with a functional layer, formed highly precisely and in a complicated pattern shape using a vacuum ultraviolet ray. <P>SOLUTION: A wettability variable part with wettability varied in pattern shape is formed on a pattern forming face, by arranging a metal mask 10 on the pattern forming face, using a pattern forming substrate 1 having the pattern forming face with wettability varied by irradiation of the vacuum ultraviolet ray, and by irradiating the pattern forming face with the vacuum ultraviolet ray via the metal mask 10, in the presence of a reactive gas. The functional layer is formed in pattern shape by applying a functional layer forming application liquid containing a functional material, on the pattern forming face formed with the wettability variable part. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009244575(A) 申请公布日期 2009.10.22
申请号 JP20080090712 申请日期 2008.03.31
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI;HONDA HIROYUKI;MATSUOKA MASANAO;NAGAE MITSUTAKA;OGAWA KENICHI
分类号 G03F7/20 主分类号 G03F7/20
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