摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that provides a light-shielding color filter having excellent adhesiveness to a substrate and excellent uniformity of the coating film thickness on a wafer and suppressing the generation of residue, to provide a light-shielding color filter formed from the above photosensitive resin composition and a method of producing the same, and to provide a solid-state image sensor. <P>SOLUTION: The resin composition contains at least (A) titanium black, (B) a polymerizable compound, (C) a resin, (D) a photopolymerization initiator, (E) an organic solvent and (F) a copolymer of an ethylenically unsaturated compound having a fluoroalkyl group containing ≥9 fluorine atoms and an ethylenically unsaturated compound having a carboxyl group. The light-shielding color filter formed by using the above composition, the method of producing the same and the solid-state image sensor having the above light-shielding color filter are also provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |