| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing device capable of generating uniform and highly dense plasma having high density, generating plasma having a large area, and preventing thermal destruction of a dielectric window even under high power operation, in order to perform extensive and high speed processing. <P>SOLUTION: This plasma processing device for generating plasma in a processing chamber by supplying microwave power thereto includes a waveguide disposed to supply the microwave power, a plurality of microwave coupling holes provided along the axial direction of the waveguide, a dielectric member which is made from one plate disposed along the axial direction of the waveguide and below the microwave coupling holes, and through which a microwave can be transmitted, a gap provided between a plurality of the microwave coupling holes and the dielectric member, and a cooling means to cool the dielectric member. Ring-shaped microwave coupling holes are preferably used for the microwave coupling holes. <P>COPYRIGHT: (C)2010,JPO&INPIT |
