发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition suiting application in a surface protective layer, an interlayer insulation film, and an insulation film for a high density packaging board capable of very thick application and alkali development, and capable of providing a hard object with high resolution, superior tensile elongation after fracture, and superior heat resistance. <P>SOLUTION: The radiation sensitive resin composition includes: (A) a polyimide polymer having hydroxyl group containing repeating units of two particular structures; (B) at least one type of a compound selected from an oxirane group containing compound or an oxetanyl group containing compound; (C) a compound having an alkoxyalkylated amino group; (D) a photoacid generator; and (E) a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009244628(A) 申请公布日期 2009.10.22
申请号 JP20080091622 申请日期 2008.03.31
申请人 JSR CORP 发明人 UCHIDA TARO;ASANO SHIGETO
分类号 G03F7/038;C08G59/40;H01L21/027 主分类号 G03F7/038
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