发明名称 FILM FOMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To efficiently form a film having an excellent step coverage and a high quality. Ž<P>SOLUTION: A film foming method includes a step of introducing a substrate to be treated into a treatment vessel, a step of alternately introducing at least first and second treatment gases into the treatment vessel while interposing a purge step during the step and forming a first film on the surface of the substrate to be treated, and a step of simultaneously introducing a plurality of raw-material gases into the treatment vessel after the step of forming the first film and forming a second film on the first film. The step of forming the first film is carried out under the state resting the substrate to be treated, and the step of forming the second film is carried out while rotating the substrate to be treated. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009246405(A) 申请公布日期 2009.10.22
申请号 JP20090178219 申请日期 2009.07.30
申请人 TOKYO ELECTRON LTD 发明人 JINRIKI HIROSHI;SUZUKI MIKIO
分类号 H01L21/316;C23C16/458;H01L21/31 主分类号 H01L21/316
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