APPARATUS FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: An apparatus for chemical vapor deposition is provided to increase reliability of the evaporation by supplying huge amount of gas at once and mixing gas rapidly inside a camber. CONSTITUTION: An apparatus for chemical vapor deposition comprises a chamber(10), a first feed member(31), a second feed member(32) and a supply flow channel. The chamber has a furnace in which the evaporation on an object is made. The first feed member includes a plurality of gas pipe to emit a first gas to the furnace horizontally. The second feed member includes a hole of the fixed level in which the gas pipe passes through. A second gas is materially supplied to the horizontal direction to the furnace. The supply flow channel is located between gas pipe and hole.