| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray imaging apparatus which is manufactured inexpensively and uses the multi-slit of high accuracy and a high aspect ratio, in the field of a high sensitivity X-ray imaging method by an X-ray Talbot-Lau interferometer. SOLUTION: An X-ray generation source 1 irradiates a slit member 2 with the required amount of X-rays. The slit member 2 is provided with a low absorption material 21 of a low X-ray absorption amount and a high absorption material 22 of an X-ray absorption amount larger than that of the low absorption material 21, and the low absorption material 21 and the high absorption material 22 are extended practically in the same direction. Further, the low absorption material 21 and the high absorption material 22 are alternately laminated with a prescribed pitch. The slit member 2 is disposed in such a way that the extending directions of the low absorption material 21 and the high absorption material 22 cross the advancing direction of X-rays irradiated from the X-ray generation source 1. A first grating 3 diffracts the X-ray transmitted by the slit member 2. A second grating 4 diffracts the X-ray diffracted in the first grating 3. An X-ray image detector 5 detects the X-rays diffracted in the second grating 4. COPYRIGHT: (C)2010,JPO&INPIT
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