SPUTTERING TARGET

摘要

Disclosed is a sputtering target having a flat and smooth surface having a uniform composition, which is obtained by using, as a raw material, a conductive inorganic oxide powder having finer particle size and better powder resistance than conventional conductive inorganic oxide powders. The sputtering target is obtained by molding and sintering a conductive inorganic oxide powder having an average primary particle diameter of 3-40 nm, which is provided with conductivity by being doped with one or more components selected from aluminum, gallium and indium in an amount of 0.1-20.0 wt% in terms of oxides. The conductive inorganic oxide powder is obtained by electrolytic doping wherein a slurry containing an inorganic oxide powder having an average primary particle diameter of 1-30 nm, which is blended with one or more components selected from aluminum, gallium and indium, is subjected to electrolysis.