发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a high withstanding voltage transistor wherein the current caused by impact ion is reduced by suppressing generation of hot carrier, punch through is also reduced, and a stable threshold value is provided, resulting in providing a sufficient breakdown voltage with low on-resistance. SOLUTION: In the high withstanding voltage transistor, a channel region 14 consists of: a high concentration region 14a including p-type impurity at high concentration; and a low concentration region 14b which is the region between an end part of an n-type impurity region 13a (offset impurity region 19) and the end part of the high concentration region 14a, and has the p-type impurity lower in concentration than the high concentration region 14a. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009245998(A) 申请公布日期 2009.10.22
申请号 JP20080087942 申请日期 2008.03.28
申请人 FUJITSU MICROELECTRONICS LTD 发明人 TOSHIMA NORIO
分类号 H01L29/78 主分类号 H01L29/78
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