PHOTOSENSITIVE RESIN COMPOSITION, ARTICLE MADE BY USING THE SAME AND METHOD OF FORMING NEGATIVE-TYPE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has high sensitivity, can provide a large dissolution contrast irrespective of the kind of a polyimide precursor and, resultantly, can provide a pattern having a preferable shape while maintaining sufficient process margin.

SOLUTION: The photosensitive resin composition contains a photobase generating agent and a polyimide precursor as specified compounds which are constituted of an anthracene skeleton or a thioxantone skeleton and have a substituted group of CH22-Y+X-as a base-producing part (here, Y+denotes specified quaternary ammonio group and X-denotes its counter ion).

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