METHOD OF MANUFACTURING A PHOTO MASK

摘要

PURPOSE: A manufacturing method of a photo mask is provided to form a photo mask having uniform critical dimension distribution by correcting the photo mask according to an evaluation result of the photo mask. CONSTITUTION: A photo mask is provided(S1). The photo mask is evaluated by detecting an aerial image through exposure of the photo mask(S2). An optical parameter of the photo mask related to the aerial image is corrected according to an evaluation result(S3). An exposure of the photo mask for detecting the aerial image uses the same lighting system as exposure for transferring the photo mask on a wafer.