| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for an oxide layer containing Ba and TI in which a metal layer of Cu or the like is hardly oxidized, the crystallinity is excellent, and any crack is hardly generated. Ž<P>SOLUTION: This manufacturing method includes an amorphous layer forming step of forming amorphous layers 20B, 20C of the oxide containing Ba and Ti on a metal layer 14, and a crystallizing step of crystallizing the amorphous layer 20C of the oxide containing Ba and Ti. In the amorphous layer forming step, the amorphous layers 20B, 20C of the oxide containing Ba and Ti of the thickness of 300-660 nm are formed by repeating once or a plurality of times the combination of forming a precursor layer of the oxide containing Ba and Ti with the application of the ultraviolet pulse laser beam of 1-100mJ/cm<SP>2</SP>per pulse to the precursor layer of the oxide containing Ba and Ti. Further, in the crystallizing step, the ultraviolet pulse laser beam of 60-400mJ/cm<SP>2</SP>per pulse is applied to the amorphous layer 20C of the oxide. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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