发明名称 |
PHOTOSENSITIVE ADHESIVE COMPOSITION, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, AND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive adhesive composition which is excellent in pattern formation, adhesiveness after pattern formation, heat resistance after adhesion and moisture resistance reliability, to provide an adhesive sheet, an adhesive pattern, a semiconductor wafer with adhesive layer, and a semiconductor device which use the photosensitive adhesive composition and to provide a manufacturing method of the semiconductor device. SOLUTION: The photosensitive adhesive composition for semiconductor element comprises: an alkali-soluble polymer (A) as a copolymer including maleimide monomer having a maleimide group and monofunctional vinyl monomer as a monomer unit; a thermosetting resin (B); a radiation polymerizable compound (C); and a photo initiator (D). COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009242771(A) |
申请公布日期 |
2009.10.22 |
申请号 |
JP20080251220 |
申请日期 |
2008.09.29 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
KATOGI SHIGEKI;MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI |
分类号 |
C09J179/08;C09J4/02;C09J7/00;C09J157/00;C09J163/00;C09J201/00;C09J201/02;H01L21/52 |
主分类号 |
C09J179/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|