发明名称 PHOTOSENSITIVE ADHESIVE COMPOSITION, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, AND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive adhesive composition which is excellent in pattern formation, adhesiveness after pattern formation, heat resistance after adhesion and moisture resistance reliability, to provide an adhesive sheet, an adhesive pattern, a semiconductor wafer with adhesive layer, and a semiconductor device which use the photosensitive adhesive composition and to provide a manufacturing method of the semiconductor device. SOLUTION: The photosensitive adhesive composition for semiconductor element comprises: an alkali-soluble polymer (A) as a copolymer including maleimide monomer having a maleimide group and monofunctional vinyl monomer as a monomer unit; a thermosetting resin (B); a radiation polymerizable compound (C); and a photo initiator (D). COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009242771(A) 申请公布日期 2009.10.22
申请号 JP20080251220 申请日期 2008.09.29
申请人 HITACHI CHEM CO LTD 发明人 KATOGI SHIGEKI;MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI
分类号 C09J179/08;C09J4/02;C09J7/00;C09J157/00;C09J163/00;C09J201/00;C09J201/02;H01L21/52 主分类号 C09J179/08
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