DETERGENT FOR REMOVING PLASMA ETCHING RESIDUES,申请号WO2009CN00380-传众专利搜索

发明名称	DETERGENT FOR REMOVING PLASMA ETCHING RESIDUES
摘要	<p>A detergent for removing plasma etching residues includes hydroxylamine and/or derivatives thereof, solvent, water, chelating agent, polymer containing a carboxyl group and polymer containing a pigment affinity group.</p>
申请公布号	WO2009127119(A1)	申请公布日期	2009.10.22
申请号	WO2009CN00380	申请日期	2009.04.07
申请人	ANJI MICROELECTRONICS (SHANGHAI) CO., LTD;LIU, BING;PENG, LIBBERT, HONGXIU;YU, JOEY, HAO	发明人	LIU, BING;PENG, LIBBERT, HONGXIU;YU, JOEY, HAO
分类号	G03F7/42;C11D1/83;H01L21/02	主分类号	G03F7/42
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