| 发明名称 |
Compositions for degreasing metal surfaces |
| 摘要 |
<p>Suggested are degreasing compositions comprising at least one dialkyl amide according to general formula (I)
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ R 1 CO-NR 2 R 3 €ƒ€ƒ€ƒ€ƒ€ƒ (I)
in which R 1 CO stands for a linear or branched, saturated or unsaturated, aliphatic or aromatic, optionally hydroxysubstituted acyl radical having 2 to 56 carbon atoms, and R 2 and R 3 represent independently from each other alkyl radicals having 1 to 6 carbon atoms.</p> |
| 申请公布号 |
EP2110462(A1) |
申请公布日期 |
2009.10.21 |
| 申请号 |
EP20080007673 |
申请日期 |
2008.04.19 |
| 申请人 |
COGNIS IP MANAGEMENT GMBH;INSTITUT UNIV. DE CIENCIA I TECNOLOGIA, S.A. |
发明人 |
BIGORRA LLOSAS, JOAQUIN;RAYA, JAVIER;VALLS, RAMON;ESTEVEZ, CARLES;GALIA, LIDIA;CASTELLS, JOSEP |
| 分类号 |
C23G5/028;C11D1/52;C11D7/32;C11D11/00;C23G5/036 |
主分类号 |
C23G5/028 |
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