| 摘要 |
PURPOSE: A substrate drying device, a substrate process device and a substrate drying method for preventing the generation of process defect are provided to remove the liquid from the substrate. CONSTITUTION: A substrate drying device performs a drying process of a substrate. The substrate drying device includes a substrate rotation support device, a liquid layer formation unit, and a gas discharge unit(670). The substrate rotation support device insufficiently turns the substrate. The liquid layer formation unit forms the liquid layer of the rinse liquid on the substrate supported in the substrate rotation support device. The gas is discharged towards the central unit of the liquid layer of the rinse liquid formed by the liquid layer formation part on the substrate.
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