发明名称 ANTI-STATIC SILICON RESIN COMPOSITION, BLANKET, SILICON MOLD AND ABSORPTION BELT FOR PRINTING USING THE SAME
摘要 PURPOSE: An anti-static silicon resin composition is provided to ensure low surface resistance and little electro static discharge, and to prevent the contamination caused by dust and the degradation of print quality. CONSTITUTION: An anti-static silicon resin composition comprises 100 parts by weight of a silicon resin and 0.0001 ~ 12 parts by weight of antistatic agent. The antistatic agent is represented by chemical formula: M+[X(YOmRf)n]-, wherein M is alkali metal; Rf is C1-4 perfluoroalkyl group; Y is C or S; X is N or C; m is 1 when Y is C, and is 2 when Y is S; n is 2 when X is nitrogen, and is 3 when X is carbon.
申请公布号 KR20090109732(A) 申请公布日期 2009.10.21
申请号 KR20080035116 申请日期 2008.04.16
申请人 LG CHEM. LTD. 发明人 CHUN, SANG KI;HWANG, IN SEOK;LEE, DONG WOOK;KIM, SEUNG WOOK;JEON, KYOUNG SU
分类号 C08K3/10;C08J5/00;C08L83/00 主分类号 C08K3/10
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