| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate for an electro-optic device with excellent optical characteristics and electric characteristics, and hardly giving rise to deformation on a base material. <P>SOLUTION: The method includes an amorphous layer forming process forming an amorphous layer 9a on a substrate 101, a crystal nucleus forming process generating crystal nucleuses in the amorphous layer 9a under a heat treatment of 140 to 160°C , and a crystal growth process obtaining a conductive layer 9 by growing the crystal nucleuses generated under a heat treatment of 70 to 90°C. <P>COPYRIGHT: (C)2004,JPO</p> |
