发明名称 Image sensor and fabricating method thereof
摘要 An image sensor and fabricating method thereof are provided. The image sensor can include differently microlenses formed on a pixel array substrate. The differently shaped microlenses are formed using a phase mask where the light blocking region for each microlens pattern is positioned according to the relative angle of the microlens to a main lens. The phase shift mask results in a dome shaped microlens at a region of the pixel array substrate receiving incident light from the same axis as light incident the main lens and in asymmetrical shaped microlenses with a thicker region in a portion of the microlens farthest from the dome shaped microlens.
申请公布号 US7605980(B2) 申请公布日期 2009.10.20
申请号 US20070863350 申请日期 2007.09.28
申请人 DONGBU HITEK CO., LTD. 发明人 KIM SHANG WON
分类号 G02B27/10 主分类号 G02B27/10
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