发明名称 |
Method of gap-filling using amplitude modulation radio frequency power |
摘要 |
A method of filling a gap on a substrate comprises disposing the substrate, on which the gap is formed, on a susceptor in a chamber; applying a source power to the chamber to generate plasmas into the chamber; supplying a process gas into the chamber; filling a thin film into a gap by applying a first bias power to the susceptor, an amplitude of the first bias power being periodically modulated; stopping supply of the process gas and cutting off the first bias power; and extinguish the plasmas in the chamber.
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申请公布号 |
US7605084(B2) |
申请公布日期 |
2009.10.20 |
申请号 |
US20070746566 |
申请日期 |
2007.05.09 |
申请人 |
JUSUNG ENGINEERING CO., LTD. |
发明人 |
HAN JEONG-HOON;YOO JIN-HYUK;KIM YOUNG-ROK |
分类号 |
H01L21/42 |
主分类号 |
H01L21/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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