发明名称 |
Photomasks |
摘要 |
Photomasks are disclosed. A disclosed example photomask comprises: a first pattern located along an axis of the photomask; at least one second pattern located a distance from and a predetermined angle to the first pattern; and slits made of Cr on at least one end of each of the first and second patterns, wherein the photomask is a Cr-less mask. |
申请公布号 |
US7604905(B2) |
申请公布日期 |
2009.10.20 |
申请号 |
US20040026486 |
申请日期 |
2004.12.29 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
KIM HONG LAE |
分类号 |
G03F1/00;G03F1/08;G03C5/00;G03F1/14;G03F1/34;G03F1/54;G03F9/00;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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