发明名称 PHOTOSENSITIVE POLYMERS AND RESIST COMPOSITION INCLUDING SAME
摘要 <p>A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.</p>
申请公布号 KR100922841(B1) 申请公布日期 2009.10.20
申请号 KR20070133685 申请日期 2007.12.18
申请人 发明人
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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